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High purity Palladium Pd 99.99% sputtering target for laboratory
Product uses industrial-grade coating, experiments or research level Pd target Palladium target, electronics, optoelectronics, military, decorative, functional film... 		2017-11-24
sputtering target ATO 99.99% Ion Beam Sputtering
ATO(Sb2O3+SnO2) target 99.99% Physical properties Color Blue Density 2.0g/ml Technical indicators purity 99.99% Relative density >99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material ATO (Sb2O3... 		2017-11-08
Unbalanced magnetron sputtering target CeO2 ceric oxide
Technical indicators purity CeO2/TREO99.99%;TREO99.97% Relative density>99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material CeO2 Brand MAT-CN Origin Nanchang Jiangxi Specifications Size 0... 		2017-10-21
Low tolerance Carbon C sputtering target Ion Beam Sputtering
C target Carbon target (MAT-CN) Physical properties Color black Density 2.26g/m³ Melting point 3500 Technical indicators purity 99.99% Relative density >99.9% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain si... 		2017-10-03
The finishing surface CuCr Copper-chromium-sputtering target Ion Beam Sputtering
CuCr target Copper-chromium target (MAT-CN) Physical properties Color silver Density -g/m³ Melting point - Technical indicators purity 99.99% Relative density >99.9% Cut surface flatne... 		2017-07-10
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